Thermal oxidation refers to a chemical process in which a material, typically a solid or liquid, undergoes a chemical reaction with oxygen molecules in the presence of heat, leading to the production of new substances. This process is commonly used in industrial applications and plays a crucial role in various fields, including materials science, chemistry, and engineering.
The thermal oxidation process typically occurs at elevated temperatures, allowing the material to react more readily with oxygen. As a result of this reaction, the material's molecular structure is altered, often leading to the formation of oxides or other chemical compounds. This process is also known as combustion or burning, although thermal oxidation is usually a slower and controlled process compared to rapid combustion.
Thermal oxidation is widely used in several industries, such as metallurgy, where it is employed to enhance the quality and durability of metal surfaces. By subjecting metals to controlled oxidation at high temperatures, a layer of metal oxide is formed. This oxide layer can provide increased protection against corrosion, improve adhesion for coatings, or alter the material's surface properties.
In the semiconductor industry, thermal oxidation is used to grow thin layers of silicon dioxide, known as thermal oxide, on silicon wafers. This technique is crucial in creating insulating layers, isolating different circuit components on integrated circuits, or improving the electrical characteristics of silicon surfaces.
Overall, thermal oxidation is a valuable process for modifying the properties of materials, providing improved performance, durability, or desired characteristics for various applications.
